scia Coat 200
Scia Coat 200 dual ion beam sputtering coating machine has excellent uniformity and is suitable for coating substrates with diameters up to Φ 200 mm. By using ion beam sputtering coating instead of other coating processes, smooth and defect free films can be obtained. Online film thickness optical monitoring ensures good process stability. In addition, the system can be applied to substrates of any shape, including wafers.
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General attributesThe main ion source is used to sputter the target material onto the sample substrate and deposit it into a film; Secondary ion sources are used for sample surface ion beam bombardment cleaning or auxiliary coating.Sedimentable media and metal filmsCapable of online substrate pretreatment (etching, cleaning, smoothing)By rotating and tilting the substrate, excellent deposition uniformity can be achievedThere can be up to 5 water-cooled target materials on the drum target rack for online replacementUse quartz crystal oscillator and/or optical thickness monitor (OTM) to menu control multi-layer film depositionAdapt to different substrate sizesOptionally equipped with a Φ 350 mm ion beam source as an auxiliary source, it can also be used for ion beam etching processesApplied to magnetic sensor multilayer films (GMR, TMR, spin electron)Applied to magnetic sensor multilayer films (GMR, TMR, spin electron)
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Optional configuration
-Optional box type carrier for single work compartment
-Optional combination system with box type carrier
