Scia RF ion source RF series
Ion beams, plasmas, and their control are the core technologies of Scia, and the uniqueness of all its equipment lies in this.
The RF ion source adopts ICP excitation plasma, with built-in RF matching and generator, and has multiple circular apertures with a maximum diameter of 450mm. The movable ion source comes with an RF matching device, which is particularly suitable for ion beam polishing applications.
