scia Multi 1500
The Scia Multi 1500 magnetron sputtering coating system is specifically designed for high-precision optical multilayer film manufacturing. It can deposit ultra-thin multilayer films with over 100 cycles on flat or curved substrates with a diameter of less than Φ 1500mm, and can deposit high-precision uniform or gradient films. Modular warehouse design, with independent coating process room, buffer room, and loading room, while taking into account the flexibility of configuration, production capacity, and maintainability.
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General attributesMagnetron sputtering technology utilizes plasma ion bombardment to sputter target materials, thereby depositing thin films on the surface of sample substratesUsing synchronous sample linear and rotational motion to form uniform or gradient thin films on curved substratesThe inline layout with multiple process chambers and buffer chambers enables large-diameter samples to completely cross the magnetron source4 magnetic control sources per process roomOptional additional ion beam source for pre-treatment before coatingThe sample is loaded face down to reduce particle contamination
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Optional configuration
-Optional sample loading and dynamic balancing mechanism
-Multiple coating process rooms can be added in a row, and each process room can be equipped with up to 4 magnetron sources
